The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2015

Filed:

Jul. 17, 2013
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Hiroji Hanawa, Sunnyvale, CA (US);

Satoru Kobayashi, Santa Clara, CA (US);

Kartik Ramaswamy, San Jose, CA (US);

Shahid Rauf, Pleasanton, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 27/26 (2006.01); G01R 25/02 (2006.01); G01R 15/18 (2006.01); G01R 27/32 (2006.01); G01R 19/00 (2006.01); H05H 1/00 (2006.01);
U.S. Cl.
CPC ...
G01R 27/32 (2013.01); G01R 19/0061 (2013.01); H05H 1/0081 (2013.01);
Abstract

An RF current probe is encapsulated in a conductive housing to permit its placement inside a plasma reactor chamber. An RF voltage probe is adapted to have a long coaxial cable to permit a measuring device to be connected remotely from the probe without distorting the voltage measurement.


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