Santa Clara, CA, United States of America

Satoru Kobayashi

This inventor holds 29 USPTO granted patents and 5 published patent applications, primarily in Plasma Processing. Top assignee: Applied Materials, Inc.. Active years: 2011-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoru Kobayashi. Retrieved from https://idiyas.com/inventor/satoru-kobayashi-6yccavei

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29 

% Patents Active = 93.1

Average Co-Inventor Count = 5.1

ph-index = 7

Forward Citations = 722(Granted Patents)


Location History:

  • Mountain View, CA (US) (2011)
  • Santa Clara, CA (US) (2013 - 2024)
  • Sunnyvale, CA (US) (2019 - 2024)

Company Filing History:


Years Active: 2011-2025

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Areas of Expertise:
Plasma Processing
Microwave Cavities
Plasma Uniformity
Impedance Shifting
Radial Control
Power-Supplying Waveguide
Digital Control
Chuck Designs
Inductively Coupled Plasma
Ceramic Ring Test Device
VHF Sensors
Radial Waveguide Systems
29 patents (USPTO):Explore Patents

Title: Satoru Kobayashi: Innovator in Plasma Processing Technology

Introduction: Satoru Kobayashi, based in Santa Clara, CA, is a renowned inventor and a valuable asset in the field of plasma processing technology. With an impressive portfolio of 29 patents, Kobayashi has made significant contributions to innovative solutions that enhance manufacturing processes in various applications.

Latest Patents: Among Kobayashi's noteworthy inventions are two recent patents. The first, titled "Cylindrical cavity with impedance shifting by irises in a power-supplying waveguide," details a plasma reactor featuring a cylindrical microwave cavity over a workpiece processing chamber. This invention includes a pair of waveguides that optimize microwave input through strategically placed ports and coupling mechanisms. The second, "Low temperature chuck for plasma processing systems," presents a sophisticated wafer chuck assembly comprising an electrically insulating puck embedded with electrodes, designed meticulously for optimal thermal management during plasma processing.

Career Highlights: Kobayashi has established himself as a key figure at Applied Materials, Inc., a leading company in advanced materials engineering. His extensive experience and innovative mindset have propelled numerous advancements within the organization, reinforcing Applied Materials' reputation as a powerhouse in the semiconductor industry.

Collaborations: Throughout his career, Kobayashi has had the privilege of collaborating with notable colleagues, including Dmitry Lubomirsky and Soonam Park. These partnerships have fostered an environment of creativity and innovation, leading to groundbreaking technologies and solutions that have impacted multiple sectors.

Conclusion: Satoru Kobayashi's contributions to the field of plasma processing technology exemplify the spirit of innovation and the role of inventors in advancing industrial capabilities. With his extensive patent portfolio, Kobayashi continues to push the boundaries of technology, inspiring future generations of inventors and researchers in the process.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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