The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2019
Filed:
Dec. 07, 2018
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Satoru Kobayashi, Santa Clara, CA (US);
Hideo Sugai, A'ichi, JP;
Soonam Park, Sunnyvale, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Dmitry Lubomirsky, Cupertino, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32192 (2013.01); H01J 37/3222 (2013.01); H01J 37/32302 (2013.01); H01J 37/32311 (2013.01);
Abstract
A plasma reactor for processing a workpiece has a microwave source with a digitally synthesized rotation frequency using direct digital up-conversion and a user interface for controlling the rotation frequency.