The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
Dec. 12, 2007
Imad Yousif, San Jose, CA (US);
Anchel Sheyner, San Francisco, CA (US);
Ajit Balakrishna, Sunnyvale, CA (US);
Nancy Fung, Sunnyvale, CA (US);
Ying Rui, Santa Clara, CA (US);
Martin Jeffrey Salinas, San Jose, CA (US);
Walter R. Merry, Sunnyvale, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Imad Yousif, San Jose, CA (US);
Anchel Sheyner, San Francisco, CA (US);
Ajit Balakrishna, Sunnyvale, CA (US);
Nancy Fung, Sunnyvale, CA (US);
Ying Rui, Santa Clara, CA (US);
Martin Jeffrey Salinas, San Jose, CA (US);
Walter R. Merry, Sunnyvale, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Polymer is removed from the backside of a wafer held on a support pedestal in a reactor using an arcuate side gas injection nozzle extending through the reactor side wall with a curvature matched to the wafer edge and supplied with plasma by-products from a remote plasma source.