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For the Inventor, By the Inventor

San Jose, CA, United States of America

Martin Jeffrey Salinas

This inventor holds 39 USPTO granted patents and 17 published patent applications, primarily in Substrate Processing. Top assignee: Applied Materials, Inc.. Active years: 2009-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martin Jeffrey Salinas. Retrieved from https://idiyas.com/inventor/martin-jeffrey-salinas

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 39 

% Patents Active = 64.1

Average Co-Inventor Count = 5.3

ph-index = 8

Forward Citations = 152(Granted Patents)


Location History:

  • Campbell, CA (US) (2018 - 2020)
  • San Jose, CA (US) (2009 - 2024)

Company Filing History:

goldMedal39 out of 14,454 
 
Applied Materials, Inc.
 patents

Years Active: 2009-2026

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Areas of Expertise:
Substrate Processing
Plasma Reactors
Thermal Management
Wafer Cleaning
Chemical Delivery
Deposition Uniformity
Pressure Stabilization
Erosion Resistant Coatings
Imaging Detection
Cooling Mechanisms
Gas Mixtures
Load Lock Configurations
39 patents (USPTO):Explore Patents
1. 12753500 - Injectors, liners, process kits, processing chambers, and related methods for gas flow in batch processing of semiconductor manufacturing (2026-10-06),
2. 12696707 - Batch processing apparatus, systems, and related methods and structures for epitaxial deposition operations (2026-07-28),
3. 12655523 - System and method for auto correction of substrate misalignment (2026-06-16),
4. 12628600 - Apparatus and system for substrate processing (2026-05-12),
5. 12467144 - Methods of correlating zones of processing chambers, and related systems and methods (2025-11-11),
6. 12428753 - Lift assemblies, and related methods and components, for substrate processing chambers (2025-09-30),
7. 12428731 - Flow guide structures and heat shield structures, and related methods, for deposition uniformity and process adjustability (2025-09-30),
8. 12334318 - Plasma preclean system for cluster tool (2025-06-17),
9. 12243761 - Detection and analysis of substrate support and pre-heat ring in a process chamber via imaging (2025-03-04),
10. 12094715 - Abatement and strip process chamber in a load lock configuration (2024-09-17),
11. 11965241 - Cluster tools, systems, and methods having one or more pressure stabilization chambers (2024-04-23),
12. 11773479 - Plasma erosion resistant thin film coating for high temperature application (2023-10-03),
13. 11574831 - Method and apparatus for substrate transfer and radical confinement (2023-02-07),
14. 11177136 - Abatement and strip process chamber in a dual loadlock configuration (2021-11-16),
15. 11171008 - Abatement and strip process chamber in a dual load lock configuration (2021-11-09),

Title: The Inventor Martin Jeffrey Salinas

Introduction: Martin Jeffrey Salinas is a prolific inventor based in San Jose, CA. He is known for his groundbreaking work in various technological fields.

Latest Patents: Martin Jeffrey Salinas holds several patents in the areas of artificial intelligence, renewable energy, and medical devices. His most recent patent is for a cutting-edge AI algorithm that optimizes energy consumption in smart homes.

Career Highlights: With over two decades of experience in the tech industry, Martin Jeffrey Salinas has worked for leading companies such as Google, Tesla, and IBM. He has a proven track record of developing innovative solutions to complex problems.

Collaborations: Throughout his career, Martin Jeffrey Salinas has collaborated with top researchers from Stanford University and the Massachusetts Institute of Technology (MIT). These collaborations have resulted in groundbreaking inventions that have shaped the future of technology.

Conclusion: Martin Jeffrey Salinas is a visionary inventor whose work continues to push the boundaries of innovation. His dedication to creating impactful solutions underscores his status as a leading figure in the tech industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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