The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
Jun. 09, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Songjae Lee, San Jose, CA (US);
Masato Ishii, Sunnyvale, CA (US);
Martin Truemper, Austin, TX (US);
Richard O. Collins, Santa Clara, CA (US);
Martin Jeffrey Salinas, San Jose, CA (US);
Yong Zheng, Dublin, CA (US);
Anita Zhao, Sunnyvale, CA (US);
Adele Mariadass, Reno, NV (US);
Christophe Marcadal, Santa Clara, CA (US);
Henry Barandica, San Jose, CA (US);
Ernesto J. Ulloa, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma processing system for cleaning a substrate is provided. The plasma processing system includes a process chamber that includes: a chamber body enclosing an interior volume; and a substrate support disposed in the interior volume. The plasma processing system includes a vacuum pump; a first exhaust line fluidly coupled between the interior volume of the process chamber and the vacuum pump; and a second exhaust line fluidly coupled between the interior volume of the process chamber and the vacuum pump. The first exhaust line and the second exhaust line are arranged to provide alternative paths for the exhaust between the interior volume and the vacuum pump, and the first exhaust line has an internal diameter that is at least 50% smaller than the internal diameter of the second exhaust line.