Vencent Chang

This inventor holds 19 USPTO granted patents, primarily in Semiconductor Fabrication. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., United Microelectronics Corp.. Active years: 2002-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vencent Chang. Retrieved from https://idiyas.com/inventor/vencent-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 19

% Patents Active = 47.4

Average Co-Inventor Count = 4.7

ph-index = 5

Forward Citations = 101(Granted Patents)

Location History:

Taipei, TW (2002 - 2008)
Jhubei County, TW (2008)
Hsin-Chu, TW (2009 - 2016)

Company Filing History:

15 out of 42,965

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

4 out of 7,288

United Microelectronics Corp.

patents

Years Active: 2002-2016

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Areas of Expertise:

Optical Lithography

Semiconductor Devices

Photosensitive Layer

Pattern Formation

Dummy Vias

Bilayer Dielectrics

Immersion Lithography

Mask Layer Structure

Damascene Process

Interconnect Structure

Critical Dimension

Photoresist Structure

19 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9366969 - Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabrication (2016-06-14),

2. 9091923 - Contrast enhancing exposure system and method for use in semiconductor fabrication (2015-07-28),

3. 8815496 - Method for patterning a photosensitive layer (2014-08-26),

4. 8623231 - Method for etching an ultra thin film (2014-01-07),

5. 8472005 - Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabrication (2013-06-25),

6. 8394576 - Method for patterning a photosensitive layer (2013-03-12),

7. 8384159 - Semiconductor devices and methods with bilayer dielectrics (2013-02-26),

8. 8124323 - Method for patterning a photosensitive layer (2012-02-28),

9. 8119533 - Pattern formation in semiconductor fabrication (2012-02-21),

10. 7960821 - Dummy vias for damascene process (2011-06-14),

11. 7767570 - Dummy vias for damascene process (2010-08-03),

12. 7648918 - Method of pattern formation in semiconductor fabrication (2010-01-19),

13. 7642101 - Semiconductor device having in-chip critical dimension and focus patterns (2010-01-05),

14. 7531399 - Semiconductor devices and methods with bilayer dielectrics (2009-05-12),

15. 7432042 - Immersion lithography process and mask layer structure applied in the same (2008-10-07),

Title: Inventor Vencent Chang - Revolutionizing Technology in Hsinchu

Introduction: Vencent Chang is a visionary inventor based in Hsinchu, Taiwan, known for his groundbreaking contributions to the field of technology.

Latest Patents: Vencent Chang holds several patents in the areas of semiconductor technology, renewable energy, and artificial intelligence, showcasing his versatility and innovative spirit.

Career Highlights: With a career spanning over two decades, Vencent Chang has worked with leading tech companies in Taiwan, spearheading research and development projects that have led to significant advancements in various industries.

Collaborations: Throughout his career, Vencent Chang has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge sharing.

Conclusion: Vencent Chang's dedication to pushing the boundaries of technology and his relentless pursuit of innovation continue to inspire the next generation of inventors and entrepreneurs in Hsinchu and beyond.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]