The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2012

Filed:

Dec. 31, 2009
Applicants:

George Liu, Shin-Chu, TW;

Kuei Shun Chen, Hsin-Chu, TW;

Vencent Chang, Hsinchu, TW;

Shang-wen Chang, Jhubei, TW;

Inventors:

George Liu, Shin-Chu, TW;

Kuei Shun Chen, Hsin-Chu, TW;

Vencent Chang, Hsinchu, TW;

Shang-Wen Chang, Jhubei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/467 (2006.01); H01L 23/58 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided is a semiconductor device. The device includes a substrate having a photo acid generator (PAG) layer on the substrate. The PAG layer is exposed to radiation. A photoresist layer is formed on the exposed PAG layer. The exposed PAG layer generates an acid. The acid decomposes a portion of the formed photoresist layer. In one embodiment, the PAG layer includes organic BARC. The decomposed portion of the photoresist layer may be used as a masking element.


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