Kyoto, Japan

Toshio Seki

USPTO Granted Patents = 11 

 

Average Co-Inventor Count = 4.8

ph-index = 5

Forward Citations = 91(Granted Patents)


Location History:

  • Hitachi, JP (1987 - 1989)
  • Uji, JP (2013)
  • Kyoto, JP (2008 - 2018)

Company Filing History:


Years Active: 1987-2018

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11 patents (USPTO):Explore Patents

Title: Innovator Toshio Seki: Pioneering Substrate Cleaning Technologies

Introduction

Toshio Seki, a distinguished inventor based in Kyoto, Japan, has made significant contributions to the field of substrate cleaning technologies. With an impressive portfolio of 11 patents, his innovative approaches have revolutionized methods for cleaning substrates crucial in various industries, particularly in electronics manufacturing.

Latest Patents

Among his latest inventions, Seki has developed a variety of specialized technologies including a substrate cleaning method, a substrate cleaning device, and a vacuum processing device. His substrate cleaning method focuses on effectively removing particles adhered to a substrate by acquiring particle information about their diameters and controlling factors related to the sizes of gas clusters containing cleaning gas. This innovative technique allows for the ejection of the cleaning gas at a higher pressure than the processing atmosphere, which generates gas clusters through adiabatic expansion. Remarkably, this method is capable of removing particles from surface recesses of circuit patterns with impressive efficiency.

Another notable patent is his method of smoothing solid surfaces using a gas cluster ion beam. This method strategically targets scratches on solid surfaces, ensuring that contaminants remaining on side-walls are exposed to gas clusters, improving surface quality. The versatility of his technologies showcases Seki's in-depth understanding of materials and processes in semiconductor manufacturing.

Career Highlights

Toshio Seki's career is marked by his extensive experience in prominent companies, including Japan Aviation Electronics Industry, Limited and Hitachi, Ltd. His work in these organizations has not only enhanced their operational capabilities but has also influenced industry standards in substrate processing technologies.

Collaborations

Throughout his career, Seki has collaborated with notable colleagues such as Jiro Matsuo and Akinobu Sato. These partnerships have facilitated the advancement of innovative techniques and products, with each member contributing their unique expertise to stimulate progress in the field.

Conclusion

As an influential inventor, Toshio Seki's contributions to substrate cleaning and surface smoothing technologies have positioned him as a key figure in the advancements of electronic manufacturing processes. His 11 patents reflect a commitment to innovation and excellence, further solidifying his legacy within the industry.

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