The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Aug. 10, 2009
Kunihiko Koike, Moriyama, JP;
Takehiko Senoo, Osaka, JP;
Yu Yoshino, Moriyama, JP;
Shuhei Azuma, Tokyo, JP;
Jiro Matsuo, Uji, JP;
Toshio Seki, Uji, JP;
Satoshi Ninomiya, Uji, JP;
Kunihiko Koike, Moriyama, JP;
Takehiko Senoo, Osaka, JP;
Yu Yoshino, Moriyama, JP;
Shuhei Azuma, Tokyo, JP;
Jiro Matsuo, Uji, JP;
Toshio Seki, Uji, JP;
Satoshi Ninomiya, Uji, JP;
Iwatani Corporation, Osaka-Shi, Osaka, JP;
Kyoto University, Kyoto-Shi, Kyoto, JP;
Abstract
A method for processing a sample using an electrically neutral reactive cluster is provided. The surface of a sample is processed by jetting out a mixed gas that is composed of a reactive gas and a gas with a boiling point lower than that of the reactive gas from a gas jetting part of a vacuum process room in which the sample is placed by a pressure in a range in which the mixed gas is not liquefied, in a predetermined direction, while adiabatically-expanding the mixed gas, thereby generating a reactive cluster and jetting the reactive cluster against the sample in the vacuum process room.