Shuhei Azuma

Title: Shuhei Azuma: Innovator in Semiconductor Processing

Introduction

Shuhei Azuma is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor processing through his innovative methods and technologies. His work has implications for various applications in electronics and microtechnology.

Latest Patents

Shuhei Azuma holds a patent for a "Cluster jet processing method, semiconductor element, microelectromechanical element, and optical component." This patent describes a method for processing a sample using an electrically neutral reactive cluster. The technique involves jetting a mixed gas composed of a reactive gas and a gas with a lower boiling point from a gas jetting part in a vacuum process room. This process allows for the generation of a reactive cluster that is directed against the sample, facilitating advanced processing techniques.

Career Highlights

Throughout his career, Shuhei Azuma has worked with notable organizations, including Iwatani Corporation and Kyoto University. His experience in these institutions has allowed him to develop and refine his innovative approaches to semiconductor processing.

Collaborations

Shuhei Azuma has collaborated with esteemed colleagues such as Kunihiko Koike and Takehiko Senoo. These partnerships have contributed to the advancement of his research and the successful implementation of his patented technologies.

Conclusion

Shuhei Azuma's contributions to semiconductor processing highlight his role as a key innovator in the field. His patented methods and collaborations with other experts underscore the importance of teamwork in driving technological advancements.