The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2012
Filed:
May. 18, 2006
Akinobu Sato, Tokyo, JP;
Akiko Suzuki, Tokyo, JP;
Emmanuel Bourelle, Reims, FR;
Jiro Matsuo, Kyoto, JP;
Toshio Seki, Kyoto, JP;
Akinobu Sato, Tokyo, JP;
Akiko Suzuki, Tokyo, JP;
Emmanuel Bourelle, Reims, FR;
Jiro Matsuo, Kyoto, JP;
Toshio Seki, Kyoto, JP;
Japan Aviation Electronics Industry, Limited, Tokyo, JP;
Abstract
A method for flattening a sample surface by irradiating the sample surface with a gas cluster ion beam, generates clusters of source gas in a cluster generating chamber, ionizes the generated clusters in an ionization chamber, accelerates the ionized cluster beam in an electric field of an accelerating electrode, selects a cluster size using a magnetic field of a sorting mechanism, and irradiates the surface of a sample. An irradiation angle between the sample surface and the gas cluster ion beam is less than 30° and an average cluster size of the gas cluster ion beam is 50 or above.