The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Nov. 04, 2015
Applicant:

Japan Aviation Electronics Industry, Limited, Shibuya-ku, Tokyo, JP;

Inventors:

Akinobu Sato, Tokyo, JP;

Akiko Suzuki, Tokyo, JP;

Emmanuel Bourelle, Montmirail, FR;

Jiro Matsuo, Kyoto, JP;

Toshio Seki, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/00 (2006.01); C23F 4/00 (2006.01); H01J 27/02 (2006.01); H01J 37/20 (2006.01); H01J 37/305 (2006.01); H01J 37/317 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
C23F 4/00 (2013.01); H01J 27/026 (2013.01); H01J 37/20 (2013.01); H01J 37/3053 (2013.01); H01J 37/317 (2013.01); H01J 2237/20207 (2013.01); H01J 2237/20214 (2013.01); H01L 21/3065 (2013.01);
Abstract

A method of smoothing a solid surface with a gas cluster ion beam includes irradiating the solid surface with the gas cluster ion beam. The irradiating includes, when scratches which can be likened to a line-and-space pattern structure with widths and heights on the order of a submicrometer to micrometer are present on the solid surface, a process of emitting the gas cluster ion beam so as to expose substances, which remain on side-walls of the scratches due to lateral transferal caused by collisions with gas clusters, to other gas clusters, and the gas cluster ion beam diverges non-concentrically and/or non-uniformly.


Find Patent Forward Citations

Loading…