The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Oct. 30, 2007
Akiko Suzuki, Tokyo, JP;
Akinobu Sato, Tokyo, JP;
Emmanuel Bourelle, Montmirail, FR;
Jiro Matsuo, Kyoto, JP;
Toshio Seki, Kyoto, JP;
Akiko Suzuki, Tokyo, JP;
Akinobu Sato, Tokyo, JP;
Emmanuel Bourelle, Montmirail, FR;
Jiro Matsuo, Kyoto, JP;
Toshio Seki, Kyoto, JP;
Japan Aviaton Electronics Industry, Limited, Tokyo, JP;
Abstract
A solid surface is processed while corner portions of a relief structure are protected from deformation. A method of processing a solid surface with a gas cluster ion beam includes a cluster protection layer formation step of forming, on the solid surface, a relief structure having protrusions with a cluster protection layer formed to cover an upper part thereof and recesses without the cluster protection layer; an irradiation step of emitting a gas cluster ion beam onto the solid surface having the relief structure formed in the cluster protection layer formation step; and a removal step of removing the cluster protection layer. A thickness T of the cluster protection layer satisfies where n is a dose of the gas cluster ion beam, and Y is an etching efficiency of the cluster protection layer, expressed as an etching volume per cluster (a and b are constants).