The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2008
Filed:
Jul. 05, 2005
Shigeru Ono, Yokohama, JP;
Shinji Sasaki, Yokohama, JP;
Kenji Furusawa, Yokohama, JP;
Jiro Matsuo, Kyoto, JP;
Toshio Seki, Kyoto, JP;
Shigeru Ono, Yokohama, JP;
Shinji Sasaki, Yokohama, JP;
Kenji Furusawa, Yokohama, JP;
Jiro Matsuo, Kyoto, JP;
Toshio Seki, Kyoto, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
In a cluster ion beam irradiation apparatus including an apparatus for measuring size and energy distribution of gas cluster ions by using the time of flight (TOF) mass spectrometry, a unit for applying a retarding voltage is disposed in a stage preceding a TOF measuring instrument including a drift tube and a current measuring instrument. By measuring the size and energy distribution of the gas cluster ions and adjusting ionization conditions, cluster ions having predetermined energy and size are supplied to a work surface. In addition, a product of a pressure in an ion transportation device and an ion transportation length is controlled so as to satisfy the relation P×L≦30/N/EPa·m, where N is the size of gas cluster ions used for irradiation, and E is kinetic energy (eV) of the gas cluster ions.