Tokyo, Japan

Tomohisa Konno


 

Average Co-Inventor Count = 4.7

ph-index = 8

Forward Citations = 146(Granted Patents)


Location History:

  • Tokyo, JP (2003 - 2007)
  • Chuo-Ku, JP (2004 - 2009)
  • Mie, JP (2004 - 2013)
  • Yokkaichi, JP (2013)
  • Mei, JP (2013)

Company Filing History:


Years Active: 2003-2013

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18 patents (USPTO):

Title: Tomohisa Konno: Pioneering Innovator in Tokyo

Introduction: Tomohisa Konno, a visionary inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology through his dedication to innovation and relentless pursuit of excellence. With 18 patents to his name, Konno's work continues to shape the future of technology and inspire the next generation of inventors.

Latest Patents: Among his latest patents is the "Chemical Mechanical Polishing Aqueous Dispersion and Chemical Mechanical Polishing Method for Semiconductor Device". This invention involves a unique combination of water-soluble polymers, oxidizing agents, and abrasive grains to achieve precise chemical mechanical polishing for semiconductor devices. Another notable patent is the "Chemical Mechanical Planarization with Overburden Mask", a method that enables precise planarization of semiconductor wafers to expose underlying layers.

Career Highlights: Konno has made significant contributions while working at reputable companies such as JSR Corporation and International Business Machines Corporation (IBM). His expertise in semiconductor technology has led to groundbreaking innovations that have advanced the industry's capabilities.

Collaborations: Throughout his career, Konno has collaborated with esteemed colleagues such as Yoshiyuki Udagawa and Toshihiro Tadaki. Their collective expertise and dedication to innovation have resulted in groundbreaking inventions that have set new standards in the field of semiconductor technology.

Conclusion: Tomohisa Konno's innovative spirit and commitment to excellence have established him as a pioneering figure in the world of inventors. His patents and collaborations have not only shaped the future of technology but have also inspired a new generation of inventors to push the boundaries of what is possible in the field of semiconductor technology.

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