The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2013

Filed:

Sep. 27, 2007
Applicants:

Yuuji Namie, Yokkaichi, JP;

Tomohisa Konno, Yokkaichi, JP;

Masayuki Motonari, Yokkaichi, JP;

Hirotaka Shida, Yokkaichi, JP;

Akihiro Takemura, Yokkaichi, JP;

Inventors:

Yuuji Namie, Yokkaichi, JP;

Tomohisa Konno, Yokkaichi, JP;

Masayuki Motonari, Yokkaichi, JP;

Hirotaka Shida, Yokkaichi, JP;

Akihiro Takemura, Yokkaichi, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24D 3/02 (2006.01); C09C 1/68 (2006.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A chemical mechanical polishing aqueous dispersion of the invention includes (A) a first water-soluble polymer having a weight average molecular weight of 500,000 to 2,000,000 and including a heterocyclic ring in its molecule, (B) a second water-soluble polymer or its salt having a weight average molecular weight of 1000 to 10,000 and including one group selected from a carboxyl group and a sulfonic group, (C) an oxidizing agent, and (D) abrasive grains, and has a pH of 7 to 12.


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