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For the Inventor, By the Inventor

Tokyo, Japan

Masayuki Motonari

This inventor holds 21 USPTO granted patents and 3 published patent applications and 3 EPO patents, primarily in Chemical Mechanical Polishing. Top assignees: Jsr Corporation, Japan Synthetic Rubber Co., Ltd., Kabushiki Kaisha Toshiba. Active years: 1997-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayuki Motonari. Retrieved from https://idiyas.com/inventor/masayuki-motonari

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 76.2


Average Co-Inventor Count = 4.2

ph-index = 7

Forward Citations = 231(Granted Patents)


Location History:

  • Mie, JP (2004)
  • Chuo-ku, JP (2006)
  • Yokkaichi, JP (1997 - 2014)
  • Tokyo, JP (2002 - 2018)

Company Filing History:

goldMedal16 out of 1,078 
 
Jsr Corporation
 patents
silverMedal1 out of 377 
 
Japan Synthetic Rubber Co., Ltd.
 patents
bronzeMedal1 out of 53,262 
 
Kabushiki Kaisha Toshiba
 patents
4. 4 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 1997-2018

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Areas of Expertise:
Inorganic Film-Forming Composition
Resist Underlayer Film
Pattern-Forming Method
Aqueous Dispersion
Chemical Mechanical Polishing
Semiconductor Device
Polishing Pad
Polymer Particles
Composite Particles
Manufacture Process
Slurry of Inorganic Particles
21 patents (USPTO):Explore Patents
1. 10090163 - Inorganic film-forming composition for multilayer resist processes, and pattern-forming method (2018-10-02),
2. 9268229 - Composition for forming resist underlayer film, and pattern-forming method (2016-02-23),
3. 9182671 - Method for forming pattern, and composition for forming resist underlayer film (2015-11-10),
4. 9091922 - Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method (2015-07-28),
5. 8927201 - Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition (2015-01-06),
6. 8741008 - Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method (2014-06-03),
7. 8574330 - Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor device (2013-11-05),
8. 8262435 - Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and chemical mechanical polishing aqueous dispersion preparation kit (2012-09-11),
9. 8128464 - Chemical mechanical polishing pad (2012-03-06),
10. 7183211 - Process for chemical mechanical polishing of semiconductor substrate and aqueous dispersion for chemical mechanical polishing (2007-02-27),
11. 7153369 - Method of chemical mechanical polishing (2006-12-26),
12. 7087530 - Aqueous dispersion for chemical mechanical polishing (2006-08-08),
13. 6832949 - Window member for chemical mechanical polishing and polishing pad (2004-12-21),
14. 6653267 - Aqueous dispersion for chemical mechanical polishing used for polishing of copper (2003-11-25),
15. 6579153 - Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing process (2003-06-17),

Sure, I can help you with that. Here is the article about inventor Masayuki Motonari based on the given data:

Title: Unveiling the Innovations of Masayuki Motonari

Introduction:

Masayuki Motonari, a prolific inventor hailing from Tokyo, Japan, has made significant strides in the field of inorganic film-forming compositions and pattern-forming methods. With a total of 21 patents under his belt, Masayuki Motonari is a true pioneer in his field.

Latest Patents:

Masayuki Motonari's latest patents include an inorganic film-forming composition for multilayer resist processes and a composition for forming a resist underlayer film. The former involves a complex containing metal atoms, bridging ligands, and ligands derived from various organic compounds. The latter comprises a polysiloxane and a unique solvent composition.

Career Highlights:

Throughout his career, Masayuki Motonari has displayed unparalleled expertise in developing cutting-edge solutions for the semiconductor industry. His patents reflect his innovative approach to material science and process engineering, earning him a reputation as a trailblazer in the field.

Collaborations:

Masayuki Motonari has collaborated with esteemed colleagues such as Masayuki Hattori and Nobuo Kawahashi. Together, they have leveraged their collective knowledge and skills to push the boundaries of technological advancements in material synthesis and fabrication techniques.

Conclusion:

In conclusion, Masayuki Motonari's contributions to the realm of inorganic film-forming compositions and pattern-forming methods have been instrumental in shaping the landscape of modern semiconductor manufacturing. His dedication to innovation and relentless pursuit of excellence serve as an inspiration to aspiring inventors and researchers alike. Masayuki Motonari's work stands as a testament to the power of ingenuity and perseverance in driving progress and fostering technological innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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