The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8262435 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 11, 2012

Filed:

May. 18, 2009
Applicants:

Eiichirou Kunitani, Kodaira, JP;

Atsushi Baba, Yokkaichi, JP;

Masayuki Motonari, Yokkaichi, JP;

Shoei Tsuji, Mie-gun, JP;

Inventors:

Eiichirou Kunitani, Kodaira, JP;

Atsushi Baba, Yokkaichi, JP;

Masayuki Motonari, Yokkaichi, JP;

Shoei Tsuji, Mie-gun, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A chemical mechanical polishing aqueous dispersion includes: (A) an amino acid, (B) abrasive grains, (C) a surfactant, (D) an oxidizing agent, and (E) ammonia, the ratio (W/W) of the content (W) of the amino acid to the content (W) of the oxidizing agent being 1.5 to 6.0, and the ratio (W/W) of the content (W) of the ammonia to the content (W) of the oxidizing agent being 0.05 to 0.6.


Find Patent Forward Citations

Kunitani, Eiichirou. (2012). Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and chemical mechanical polishing aqueous dispersion preparation kit (U.S. Patent No. 8262435). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8262435

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