This inventor holds 6 USPTO granted patents. Top assignees: Jsr Corporation, Dsm N.v., Japan Fine Coatings. Active years: 2000-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Ibaraki, JP (2000)
- Tsuchiura, JP (2000 - 2003)
- Yokkaichi, JP (2012)
Company Filing History:


Years Active: 2000-2026
Title: Atsushi Baba: Innovator in Chemical Mechanical Polishing
Introduction
Atsushi Baba is a notable inventor based in Tsuchiura, Japan. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 6 patents. His work has advanced the technology used in various industrial applications.
Latest Patents
Atsushi Baba's latest patents include innovative solutions such as a chemical mechanical polishing aqueous dispersion, a chemical mechanical polishing method, and a chemical mechanical polishing aqueous dispersion preparation kit. The chemical mechanical polishing aqueous dispersion comprises several key components: an amino acid, abrasive grains, a surfactant, an oxidizing agent, and ammonia. The specific ratios of these components are crucial for optimal performance, with the ratio of the amino acid to the oxidizing agent being between 1.5 to 6.0, and the ratio of ammonia to the oxidizing agent ranging from 0.05 to 0.6. Additionally, he has worked on reactive silica particles and processes for their manufacturing.
Career Highlights
Throughout his career, Atsushi Baba has been associated with prominent companies such as DSM N.V. and JSR Corporation. His work in these organizations has allowed him to develop and refine his innovative ideas in chemical mechanical polishing.
Collaborations
Atsushi has collaborated with notable colleagues, including Yuichi Eriyama and Takashi Ukachi. Their combined expertise has contributed to the advancement of technologies in their field.
Conclusion
Atsushi Baba's contributions to chemical mechanical polishing demonstrate his innovative spirit and dedication to advancing technology. His patents and collaborations reflect his significant impact on the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile