Other

Jsr Corporation

Dsm N.v.

Japan Fine Coatings

Atsushi Baba

Takashi Ukachi

Yuichi Eriyama

Masayuki Motonari

Shoei Tsuji

Eiichirou Kunitani

A chemical mechanical polishing aqueous dispersion includes: (A) an amino acid, (B) abrasive grains, (C) a surfactant, (D) an oxidizing agent, and (E) ammonia, the ratio (W/W) of the content (W) of the amino acid to the content (W) of the oxidizing agent being 1.5 to 6.0, and the ratio (W/W) of the content (W) of the ammonia to the content (W) of the oxidizing agent being 0.05 to 0.6.

Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and chemical mechanical polishing aqueous dispersion preparation kit

Reactive silica particles, process for manufacturing the same, use of the same

Liquid curable resin composition, coating, and cured coating therefrom

Reactive silica particles capable of producing coatings exhibiting excellent scratch resistance, weather resistance, adhesiveness, and curability, while satisfying a wide spectrum of performances from transparency to semi-transparency and providing a glossy surface as well as a frosty surface. Reactive silica particles comprises silica particles and an organic compound chemically bonded to the silica particles via a silyloxy group, wherein the organic compound has a polymerizable unsaturated group, a group represented by the following formula (1), ##STR1## (wherein X is a group selected from --NH--, --O--, and --S-- and Y is a group selected from oxygen and sulfur, provided that when X is --O--, Y is a sulfur atom), and a group represented by the following formula (2), ##STR2## (wherein Z is a group selected from oxygen and sulfur)

Reactive silica particles, process for manufacturing the same, use of

A liquid curable resin composition containing:

Liquid curable resin composition

Growing community of inventors

Tsuchiura, Japan

Atsushi Baba