Location History:
- Mie-ken, JP (1997)
- Tokyo, JP (2003 - 2004)
- Chuo-ku, JP (2008 - 2011)
- Mie-gun, JP (2012)
Company Filing History:
Years Active: 1997-2012
Title: The Innovations of Shoei Tsuji
Introduction
Shoei Tsuji is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 8 patents. His work has been instrumental in advancing technologies related to polishing methods and materials.
Latest Patents
Tsuji's latest patents include a range of innovative products. One of his notable inventions is a chemical mechanical polishing aqueous dispersion, which comprises an amino acid, abrasive grains, a surfactant, an oxidizing agent, and ammonia. The specific ratios of these components are crucial for optimal performance. Another significant patent is for a chemical mechanical polishing pad, which includes a polymer matrix of 1,2-polybutadiene and a copolymer with a polyether block. This invention ensures that the polishing pads maintain a surface resistivity of 2.6×10^9 to 9.9×10^9 ohms.
Career Highlights
Throughout his career, Tsuji has worked with notable companies such as JSR Corporation and Japan Synthetic Rubber Co., Ltd. His experience in these organizations has allowed him to refine his expertise in chemical engineering and materials science.
Collaborations
Tsuji has collaborated with several talented individuals in his field, including Keisuke Kuriyama and Akihiko Morikawa. These partnerships have contributed to the development of his innovative patents and have fostered a collaborative environment for research and development.
Conclusion
Shoei Tsuji's contributions to the field of chemical mechanical polishing are noteworthy and have had a lasting impact on the industry. His innovative patents and collaborations highlight his dedication to advancing technology in this area.