The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Jan. 30, 2007
Takahiro Okamoto, Chuo-ku, JP;
Rikimaru Kuwabara, Chuo-ku, JP;
Keisuke Kuriyama, Chuo-ku, JP;
Shoei Tsuji, Chuo-ku, JP;
Takahiro Okamoto, Chuo-ku, JP;
Rikimaru Kuwabara, Chuo-ku, JP;
Keisuke Kuriyama, Chuo-ku, JP;
Shoei Tsuji, Chuo-ku, JP;
JSR Corporation, Tokyo, JP;
Abstract
The present invention relates to polishing pads, including at least 60 to 99 parts by weight of a polymer matrix (A) having 1,2-polybutadiene; and 1 to 40 parts by weight of component (B) having a copolymer having a polyether block, where the total amount of the polishing pad is 100 parts by mass, polymer matrix (A) includes 1,2-polybutadiene in an amount of at least 60 parts by weight, relative to 100 parts by mass of the polishing pad, component (B) includes the copolymer having a polyether block in an amount of at most 40 parts by weight relative to 100 parts by mass of the polishing pad, and the polishing pads have a surface resistivity of 2.6×10to 9.9×10Ω.