Keisuke Kuriyama

USPTO Granted Patents = 8 (Patent Applications = 1)

Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 22(Granted Patents)

Location History:

Chuo-ku, JP (2008 - 2011)
Tokyo, JP (2010 - 2018)
Minato-ku, JP (2019)

Company Filing History:

Tokyo Institute of Technology

patents

where one patent can have more than one assignee

Years Active: 2008-2019

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8 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10392699 - Method for manufacturing structure having recessed pattern, resin composition, method for forming electroconductive film, electronic circuit, and electronic device (2019-08-27),

2. 10032920 - Thin film transistor and MOS field effect transistor that include hydrophilic/hydrophobic material, and methods for manufacturing the same (2018-07-24),

3. 9980392 - Process for producing substrate having wiring, radiation-sensitive composition, electronic circuit and electronic device (2018-05-22),

4. 9746775 - Method for manufacturing substrate having concave pattern, composition, method for forming conductive film, electronic circuit and electronic device (2017-08-29),

5. 9543201 - Method for forming three-dimensional interconnection, circuit arrangement comprising three-dimensional interconnection, and metal film-forming composition for three-dimensional interconnection (2017-01-10),

6. 8053521 - Chemical mechanical polishing pad (2011-11-08),

7. 7714096 - Resin composition, cured product and optical parts (2010-05-11),

8. 7357703 - Chemical mechanical polishing pad and chemical mechanical polishing method (2008-04-15),

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1 patent pending:

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1 patent pending (EPO):

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