The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2017

Filed:

Aug. 26, 2015
Applicant:

Jsr Corporation, Minato-ku, JP;

Inventors:

Kenzou Ookita, Tokyo, JP;

Isao Aritome, Tokyo, JP;

Keisuke Kuriyama, Tokyo, JP;

Taichi Matsumoto, Tokyo, JP;

Kazuto Watanabe, Tokyo, JP;

Atsushi Kobayashi, Tokyo, JP;

Sugirou Shimoda, Tokyo, JP;

Assignee:

JSR Corporation, Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 23/535 (2006.01); H01L 23/522 (2006.01); H01L 23/485 (2006.01); H01L 23/498 (2006.01); H01L 21/48 (2006.01); H01L 21/288 (2006.01); H01L 23/48 (2006.01); H01L 23/14 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76895 (2013.01); H01L 21/288 (2013.01); H01L 21/486 (2013.01); H01L 21/76843 (2013.01); H01L 21/76873 (2013.01); H01L 21/76879 (2013.01); H01L 21/76898 (2013.01); H01L 23/481 (2013.01); H01L 23/485 (2013.01); H01L 23/49827 (2013.01); H01L 23/147 (2013.01); H01L 23/53238 (2013.01); H01L 23/53295 (2013.01); H01L 2221/1089 (2013.01); H01L 2924/0002 (2013.01);
Abstract

In a method for forming a three-dimensional interconnection, a contact plug is formed within a through hole provided in a substrate and an upper wire formed on an upper side of the substrate and a lower wire formed on a lower side are electrically connected to one another by the contact plug. A coating film is formed on an upper surface of the substrate and inner surface of the through hole by applying a metal film-forming composition containing at least one salt of and a particle of a metal to the substrate provided with the through hole. A metal film is formed by heating the coating film, and plated by filling up the through hole by depositing a conductor on the metal film by a plating process using the metal film as a seed layer. An excess conductor deposited in the plating is removed by a chemical mechanical polishing process.


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