The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2010

Filed:

Mar. 28, 2008
Applicants:

Mitsuru Ueda, Tokyo, JP;

Shinji Ando, Tokyo, JP;

Jin-gang Liu, Tokyo, JP;

Yuzi Shibasaki, Tokyo, JP;

Yasuhiro Nakamura, Tokyo, JP;

Shuichi Sugawara, Tokyo, JP;

Miwa Ariyuki, Tokyo, JP;

Yuichi Eriyama, Tokyo, JP;

Keisuke Kuriyama, Tokyo, JP;

Hideaki Takase, Tokyo, JP;

Inventors:

Mitsuru Ueda, Tokyo, JP;

Shinji Ando, Tokyo, JP;

Jin-gang Liu, Tokyo, JP;

Yuzi Shibasaki, Tokyo, JP;

Yasuhiro Nakamura, Tokyo, JP;

Shuichi Sugawara, Tokyo, JP;

Miwa Ariyuki, Tokyo, JP;

Yuichi Eriyama, Tokyo, JP;

Keisuke Kuriyama, Tokyo, JP;

Hideaki Takase, Tokyo, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08K 3/10 (2006.01); C08K 3/22 (2006.01); C08G 69/48 (2006.01); C08G 69/42 (2006.01); C08G 75/00 (2006.01); C08G 79/02 (2006.01); C08G 69/26 (2006.01); C08F 283/04 (2006.01); C09K 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

It is provided for a resin composition including (A) at least one polyamic acid having the structure represented by the following formula (1): wherein Ris independently an alkyl group having 1 to 3 carbon atoms or a cyano group; a is independently an integer of 0 to 4; R is a tetravalent organic group; n is an integer of 1 to 4; and m is an integer of 1 to 100,000, and (E) an organic solvent.


Find Patent Forward Citations

Loading…