The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2009
Filed:
Feb. 09, 2005
Tomohisa Konno, Chuo-ku, JP;
Kiyonobu Kubota, Chuo-ku, JP;
Masayuki Hattori, Chuo-ku, JP;
Nobuo Kawahashi, Chuo-ku, JP;
Tomohisa Konno, Chuo-ku, JP;
Kiyonobu Kubota, Chuo-ku, JP;
Masayuki Hattori, Chuo-ku, JP;
Nobuo Kawahashi, Chuo-ku, JP;
JSR Corporation, Tokyo, JP;
Abstract
The cleaning composition which comprises organic polymer particles (A) having a crosslinked structure and a surfactant (B) and is used after chemical mechanical polishing. The cleaning method of a semiconductor substrate is a method for cleaning semiconductor substrate given after chemical mechanical polishing, by the use of the cleaning composition. The process for manufacturing a semiconductor device including a step of chemically and mechanically polishing a semiconductor substrate and a step of cleaning the semiconductor substrate obtained after the chemical mechanical polishing, by the cleaning method.