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For the Inventor, By the Inventor

Kaohsiung, Taiwan

Ting-Hsun Chang

USPTO Granted Patents = 10

Average Co-Inventor Count = 10.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:

goldMedal10 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2020-2025

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10 patents (USPTO):Explore Patents
1. 12359090 - Composition and method for polishing and integrated circuit (2025-07-15),
2. 12172263 - Chemical mechanical planarization tool (2024-12-24),
3. 12131944 - Slurry composition, semiconductor structure and method for forming the same (2024-10-29),
4. 12002684 - Methods for chemical mechanical polishing and forming interconnect structure (2024-06-04),
5. 11772228 - Chemical mechanical polishing apparatus including a multi-zone platen (2023-10-03),
6. 11679469 - Chemical mechanical planarization tool (2023-06-20),
7. 11658065 - Chemical mechanical polishing slurry composition, method for chemical mechanical polishing and method for forming connecting structure (2023-05-23),
8. 11508585 - Methods for chemical mechanical polishing and forming interconnect structure (2022-11-22),
9. 11121028 - Semiconductor devices formed using multiple planarization processes (2021-09-14),
10. 10636701 - Methods of forming semiconductor devices using multiple planarization processes (2020-04-28),

Title: Innovations of Inventor Ting-Hsun Chang

Introduction

Ting-Hsun Chang is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 10 patents. His work focuses on enhancing the efficiency and effectiveness of integrated circuit production.

Latest Patents

Among his latest patents, Ting-Hsun Chang has developed a composition and method for polishing integrated circuits. This innovation includes a slurry composition that features a cationic surfactant with at least one nitrogen atom in its molecular structure. The slurry is designed to include a liquid carrier, abrasive materials, and a pH adjusting agent, maintaining a pH of less than 7.0. The polishing method utilizes this slurry composition to effectively polish conductive layers in integrated circuits. Additionally, he has patented a chemical mechanical planarization (CMP) tool that consists of a platen and a polishing pad. This tool features distinct polishing zones with varying surface properties, enhancing the precision of the polishing process.

Career Highlights

Ting-Hsun Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches and patented technologies have significantly contributed to advancements in semiconductor manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Liang-Guang Chen and Kei-Wei Chen, to further enhance the development of semiconductor technologies.

Conclusion

Ting-Hsun Chang's contributions to the field of semiconductor manufacturing through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and drive advancements in integrated circuit technology.

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