Location History:
- Sanyo-Onoda, JP (2017)
- Koshi, JP (2017 - 2023)
- Kumamoto, JP (2020 - 2024)
Company Filing History:
Years Active: 2017-2025
Title: **Innovator Teruhiko Kodama: Pioneering Substrate Processing Technologies**
Introduction
Teruhiko Kodama, a foremost inventor based in Koshi, Japan, has made significant contributions to the field of substrate processing. With an impressive portfolio of 16 patents, Kodama's work focuses on enhancing the efficiency and effectiveness of cleaning methods for various surfaces in the semiconductor industry.
Latest Patents
Kodama's recent innovations include the "Substrate Processing Apparatus and Substrate Processing Method." This invention introduces a sophisticated approach to substrate cleaning that involves a unique both-surface cleaning process. The method employs a first cleaning body, which either ejects fluid or comes into contact with one surface, and a second cleaning body that synchronously moves to clean both the upper and lower surfaces of the substrate. Additionally, a third cleaning body is utilized for side end cleaning, ensuring that the entire substrate is thoroughly cleaned.
The substrate processing apparatus comprises essential components such as a substrate holder, a first cleaning body, and a controller that orchestrates the movements of the cleaning bodies to optimize cleaning efficiency.
Career Highlights
Teruhiko Kodama has played a vital role in organizations like Tokyo Electron Limited, where he has contributed his expertise to advance substrate processing technologies. His work in these companies has not only solidified his reputation as an innovator but also helped propel the industry forward through his groundbreaking inventions.
Collaborations
Throughout his career, Kodama has collaborated with notable individuals, including Yasushi Takiguchi and Akihiro Kubo. Together, they have fostered innovation that addresses the complex challenges faced in substrate processing, enhancing the capabilities of semiconductor manufacturing.
Conclusion
Teruhiko Kodama stands out as a key figure in the field of substrate processing. His innovative patents and collaborative efforts within the industry underscore his dedication to advancing technology. As the semiconductor landscape continues to evolve, the impact of his contributions will undoubtedly influence future developments in substrate cleaning methodologies.