The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2020

Filed:

Nov. 28, 2017
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Yasushi Takiguchi, Kumamoto, JP;

Taro Yamamoto, Kumamoto, JP;

Yoshiki Okamoto, Kumamoto, JP;

Hayato Hosaka, Kumamoto, JP;

Teruhiko Kodama, Kumamoto, JP;

Akihiro Kubo, Kumamoto, JP;

Ryuto Ozasa, Kumamoto, JP;

Yuji Ariuchi, Kumamoto, JP;

Shinsuke Kimura, Kumamoto, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/04 (2012.01); B24B 37/10 (2012.01); B24B 41/06 (2012.01); H01L 21/02 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02016 (2013.01); B24B 37/042 (2013.01); B24B 37/10 (2013.01); B24B 41/061 (2013.01); G03F 7/70691 (2013.01); H01L 21/0209 (2013.01); H01L 21/02013 (2013.01); H01L 21/67046 (2013.01); H01L 21/67219 (2013.01); H01L 21/67225 (2013.01); H01L 21/67288 (2013.01); H01L 21/6838 (2013.01); H01L 21/6875 (2013.01); H01L 21/68742 (2013.01); H01L 21/68764 (2013.01); H01L 21/68792 (2013.01);
Abstract

A substrate processing apparatus includes: a first holding part configured to hold a substrate; a second holding part configured to hold the substrate; a sliding member configured to rotate about a vertical axis so that the sliding member slides on a back surface of the substrate; a revolution mechanism configured to revolve the sliding member under rotation about a vertical revolution axis; and a relative movement mechanism configured to horizontally move a relative position between the substrate and a revolution trajectory of the sliding member so that when the substrate is held by the first holding part, the sliding member slides on a central portion of the back surface of the substrate, and when the substrate is held by the second holding part, the sliding member slides on the peripheral portion of the back surface of the substrate under rotation.


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