Koshi, Japan

Hayato Hosaka

USPTO Granted Patents = 4 

Average Co-Inventor Count = 6.1

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Kumamoto, JP (2020)
  • Koshi, JP (2021 - 2022)

Company Filing History:


Years Active: 2020-2025

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4 patents (USPTO):Explore Patents

Title: The Innovations of Hayato Hosaka

Introduction

Hayato Hosaka is an accomplished inventor based in Koshi, Japan. With three patents to his name, he has significantly contributed to the field of substrate processing technology. His work is characterized by a focus on enhancing the efficiency and effectiveness of substrate polishing apparatuses.

Latest Patents

Among Hayato Hosaka's latest patents is a substrate processing apparatus designed to improve the polishing process of substrates. This innovative apparatus features a polishing member with a specific polishing surface, a dual dressing system, and a holding unit capable of switching between different operational states to optimize polishing efficiency. Another notable patent is a dressing apparatus and dressing method for substrate rear surface polishing members, which includes advanced design elements such as a bus member with a dual fluid nozzle for applying cleaning liquids and gases, enhancing the cleaning and dressing process of polishing pads while effectively minimizing waste and contamination.

Career Highlights

Hayato Hosaka’s career has been marked by his association with Tokyo Electron Limited, a company known for its cutting-edge technology in the semiconductor industry. He has leveraged his expertise to spearhead developments in substrate processing technologies and to help drive innovation within the organization. His innovative contributions have placed him at the forefront of industry advancements, showcasing his passion for invention and problem-solving.

Collaborations

Hayato has collaborated with notable colleagues, including Yasushi Takiguchi and Yoshiki Okamoto. Together, they have worked on various projects that focus on improving substrate processing efficiency and effectiveness. Their combined expertise has fostered an environment of innovation and creativity, resulting in several advancements in their field.

Conclusion

In summary, Hayato Hosaka is a dedicated inventor whose work at Tokyo Electron Limited has led to the development of impactful technologies in substrate processing. His insights and innovations in polishing apparatus design demonstrate a commitment to excellence and a proactive approach to addressing industry challenges. As he continues to push boundaries, his contributions remain vital to the advancement of semiconductor manufacturing processes.

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