Koshi, Japan

Ryuto Ozasa


Average Co-Inventor Count = 6.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Kumamoto, JP (2020)
  • Koshi, JP (2021)

Company Filing History:


Years Active: 2020-2021

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2 patents (USPTO):Explore Patents

Title: Ryuto Ozasa: Innovator in Substrate Processing Technologies

Introduction

Ryuto Ozasa is a notable inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 2 patents. His innovative work focuses on enhancing the efficiency and effectiveness of substrate polishing and processing methods.

Latest Patents

Ozasa's latest patents include a "Dressing apparatus and dressing method for substrate rear surface polishing member." This dressing apparatus features a bus member equipped with a ceiling plate and a skirt portion designed to accommodate a polishing pad. The apparatus includes a dual fluid nozzle that jets a cleaning liquid and gas onto the polishing surface, a dress board that contacts the polishing surface, and a rinse nozzle that supplies rinse liquid to prevent scattering of cleaning materials.

Another significant patent is the "Substrate processing apparatus, substrate processing method and storage medium." This apparatus consists of a first and second holding part for substrates, a sliding member that rotates and slides on the substrate's back surface, and a mechanism that allows for horizontal movement between the substrate and the sliding member's revolution trajectory. This design ensures optimal contact and processing of the substrate during operation.

Career Highlights

Throughout his career, Ryuto Ozasa has worked with prominent companies, including Tokyo Electron Limited. His experience in these organizations has allowed him to develop and refine his innovative ideas in substrate processing technologies.

Collaborations

Ozasa has collaborated with notable colleagues such as Yoshiki Okamoto and Yasushi Takiguchi. Their combined expertise has contributed to advancements in the field of substrate processing.

Conclusion

Ryuto Ozasa's contributions to substrate processing technologies through his patents and collaborations highlight his role as an influential inventor in this specialized field. His work continues to impact the industry positively.

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