The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2018
Filed:
Sep. 16, 2016
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Akihiro Kubo, Koshi, JP;
Teruhiko Kodama, Koshi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/20 (2012.01); H01L 21/304 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
H01L 21/304 (2013.01); B24B 37/20 (2013.01); H01L 21/02052 (2013.01); H01L 21/3043 (2013.01); H01L 21/3086 (2013.01); H01L 21/6704 (2013.01); H01L 21/67092 (2013.01);
Abstract
There is provided a substrate processing method which includes polishing a rear surface of a substrate before a pattern exposure such that the rear surface is subjected to a roughening treatment; and bypassing a roughness alleviating treatment with respect to the polished rear surface of the substrate.