The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2021
Filed:
Dec. 24, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Teruhiko Kodama, Koshi, JP;
Koichi Matsunaga, Koshi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/34 (2006.01); H01L 21/027 (2006.01); H01L 21/677 (2006.01); G03F 7/20 (2006.01); G03F 7/16 (2006.01); H01L 21/683 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/34 (2013.01); G03F 7/162 (2013.01); G03F 7/167 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/38 (2013.01); G03F 7/70 (2013.01); H01L 21/0274 (2013.01); H01L 21/6715 (2013.01); H01L 21/6773 (2013.01); H01L 21/67103 (2013.01); H01L 21/67115 (2013.01); H01L 21/67178 (2013.01); H01L 21/6833 (2013.01); H01L 21/68742 (2013.01);
Abstract
A substrate treatment apparatus for applying a coating solution to a front surface of a substrate and developing an exposed coating film on the front surface of the substrate, includes a film forming unit configured to form a friction reducing film on a rear surface of the substrate before exposure processing, the friction reducing film reducing friction between the rear surface of the substrate and a holding surface for holding the rear surface of the substrate in the exposure processing.