Company Filing History:
Years Active: 2016-2025
Title: Koichi Matsunaga: Innovator in Substrate Processing Technology
Introduction
Koichi Matsunaga is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 4 patents. His innovative work focuses on developing advanced methods and apparatuses for enhancing substrate processing efficiency.
Latest Patents
Matsunaga's latest patents include a substrate processing apparatus and a substrate processing method. The substrate processing apparatus is designed to form a friction-reducing film on the rear surface of a substrate. It features a hermetically-sealed processing space, a heating element for heating the substrate, and multiple gas suppliers to ensure optimal processing conditions. The substrate processing method involves supporting the substrate, exhausting gas, and forming a thin film through vapor deposition, with specific conditions to enhance film quality.
Career Highlights
Throughout his career, Matsunaga has been associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has significantly impacted the efficiency and effectiveness of substrate processing techniques, making him a valuable asset to his organization.
Collaborations
Matsunaga has collaborated with notable colleagues, including Teruhiko Kodama and Ainhoa Negreira. These partnerships have fostered innovation and contributed to the advancement of substrate processing technologies.
Conclusion
Koichi Matsunaga's contributions to substrate processing technology exemplify his dedication to innovation and excellence. His patents and collaborative efforts continue to influence the industry positively.