The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2024
Filed:
Aug. 09, 2019
Tokyo Electron Limited, Tokyo, JP;
Koichi Matsunaga, Kumamoto, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A method includes: supporting a rear surface of a substrate with a front surface thereof oriented upward to form a gap between the rear surface and a guide surface facing the rear surface; exhausting the gas outward of the substrate; and forming a thin film on the rear surface through vapor deposition by supplying a raw material gas from a side of the guide surface into the gap via a gas ejection port and heating the gas. The method has at least one of conditions including (a) the forming includes changing, during film formation, a height of the gap from one of a first value and a second value smaller than the first value to the other, and (b) the forming includes changing, during film formation, a ratio of flow rates of the gas ejected from first and second gas ejection ports formed at different radial positions on the substrate.