The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9418834 B1

Date of Patent:

Aug. 16, 2016

Filed:

Dec. 15, 2014

System and methods for spin-on coating of self-assembled monolayers or periodic organosilicates on a substrate

Applicant:

Tokyo Electron Limited, Minato-ku, Tokyo, JP;

Inventors:

Ainhoa Romo Negreira, Leuven, BE;

Kathleen Nafus, Leuven, BE;

Yuhei Kuwahara, Leuven, BE;

Koichi Matsunaga, Koshi, JP;

Assignee:

Tokyo Electron Limited, Tokyo, JP;

Attorney:

Primary Examiner:

Asok K Sarkar

Int. Cl.

CPC ...

H01L 21/027 (2006.01); H01L 21/02 (2006.01); H01L 21/3105 (2006.01);

U.S. Cl.

CPC ...

H01L 21/02126 (2013.01); H01L 21/02343 (2013.01); H01L 21/02359 (2013.01); H01L 21/3105 (2013.01);

Abstract

This disclosure relates to a processing system for spin-coating a substrate with Molecular Self-assembly (MSA) chemicals to form photoresist films and/or low dielectric constant (low-k) films on the substrate. The spin-coating processing system may include a spin-coating chamber that can receive and spin-coat MSA chemicals onto the substrate and an annealing chamber to thermally treat the substrate after the spin-coat process. In certain embodiments, the spin-coating processing system may also pre-treat or pre-wet the substrate prior to the spin-coating process.

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