Kathleen Nafus is a prominent inventor based in Leuven, Belgium. She has made significant contributions to the field of directed self-assembly, particularly in the development of advanced processing methods. With a total of 7 patents to her name, her work continues to influence the industry.

Latest Patents

One of her latest patents focuses on "UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly." This processing method enhances directed self-assembly (DSA) by allowing the formation of improved guide strips in the DSA template. These guide strips enable the creation of sub-30 nm features on a substrate. The innovation lies in improving the selectivity of wet chemical processing between different organic layers or films. In one embodiment, the treatment of organic layers with various wavelengths of ultraviolet light enhances this selectivity. Specifically, the first wavelength of UV light is less than 200 nm, while the second wavelength exceeds 200 nm.

Career Highlights

Kathleen Nafus is currently employed at Tokyo Electron Limited, where she applies her expertise in developing cutting-edge technologies. Her work has garnered attention for its potential to revolutionize manufacturing processes in the semiconductor industry.

Collaborations

Some of her notable coworkers include Ainhoa Negreira and Chung-Peng Ho, who contribute to her innovative projects and research endeavors.

Conclusion

Kathleen Nafus is a trailblazer in the field of directed self-assembly, with a strong portfolio of patents that reflect her innovative spirit. Her contributions continue to shape the future of technology in significant ways.

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