The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
May. 26, 2006
Chung-peng Ho, Austin, TX (US);
Kathleen Nafus, Austin, TX (US);
Kaz Yoshioka, Austin, TX (US);
Richard Yamaguchi, Gilbert, AZ (US);
Chung-Peng Ho, Austin, TX (US);
Kathleen Nafus, Austin, TX (US);
Kaz Yoshioka, Austin, TX (US);
Richard Yamaguchi, Gilbert, AZ (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion liquid from the thin film is performed prior to baking the thin film, thereby reducing the likely hood for interaction of immersion liquid with the baking process. This interaction has been shown to cause non-uniformity in critical dimension for the pattern formed in the thin film following the developing process.