Chung-Peng Ho

Title: Innovations by Chung-Peng Ho

Introduction

Chung-Peng Ho is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of lithography, particularly in the drying processes of thin films. With a total of 3 patents to his name, his work has implications for improving the quality and uniformity of patterns in thin films.

Latest Patents

One of his latest patents is titled "Method and system for drying a substrate." This invention describes a method and system for drying a thin film on a substrate following liquid immersion lithography. The process involves drying the thin film to remove immersion liquid before baking, which reduces the likelihood of interaction between the immersion liquid and the baking process. This interaction can lead to non-uniformity in critical dimensions for the patterns formed in the thin film after the developing process.

Career Highlights

Chung-Peng Ho has worked with prominent companies such as Tokyo Electron Limited and Motorola Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Some of his notable coworkers include Kathleen Nafus and Kaz Yoshioka. Their collaboration has likely fostered an environment of innovation and creativity in their respective projects.

Conclusion

Chung-Peng Ho's contributions to the field of lithography through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and improve processes related to thin film applications.