Leuven, Belgium

Yuhei Kuwahara


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Yamanashi, JP (2013)
  • Leuven, BE (2016)

Company Filing History:


Years Active: 2013-2016

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2 patents (USPTO):Explore Patents

Title: Yuhei Kuwahara: Innovator in Spin-Coating Technology

Introduction

Yuhei Kuwahara is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of spin-coating technology, particularly in the development of methods for applying self-assembled monolayers and periodic organosilicates on substrates. With a total of 2 patents to his name, Kuwahara continues to push the boundaries of innovation in his field.

Latest Patents

Kuwahara's latest patents include a "System and methods for spin-on coating of self-assembled monolayers or periodic organosilicates on a substrate." This patent describes a processing system designed for spin-coating substrates with Molecular Self-assembly (MSA) chemicals to create photoresist films and low dielectric constant (low-k) films. The system features a spin-coating chamber that applies MSA chemicals to the substrate and an annealing chamber for thermal treatment post-coating. Additionally, the patent outlines a substrate processing method that involves forming resist patterns through a series of exposure and development steps, optimizing processing conditions based on empirical data.

Career Highlights

Kuwahara is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on advancing technologies that enhance the efficiency and effectiveness of substrate processing.

Collaborations

Kuwahara collaborates with talented professionals in his field, including Ainhoa Negreira and Kathleen Nafus. Their combined expertise contributes to the innovative projects at Tokyo Electron Limited.

Conclusion

Yuhei Kuwahara's contributions to spin-coating technology and his innovative patents reflect his commitment to advancing the field. His work continues to influence the development of new materials and processes in semiconductor manufacturing.

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