Tokyo Electron Limited

Yuhei Kuwahara

Hiroshi Nakamura

Tadatoshi Tomita

Takafumi Niwa

Kathleen Nafus

Ainhoa Negreira

Koichi Matsunaga

This disclosure relates to a processing system for spin-coating a substrate with Molecular Self-assembly (MSA) chemicals to form photoresist films and/or low dielectric constant (low-k) films on the substrate. The spin-coating processing system may include a spin-coating chamber that can receive and spin-coat MSA chemicals onto the substrate and an annealing chamber to thermally treat the substrate after the spin-coat process. In certain embodiments, the spin-coating processing system may also pre-treat or pre-wet the substrate prior to the spin-coating process.

System and methods for spin-on coating of self-assembled monolayers or periodic organosilicates on a substrate

A substrate processing method includes a first process (step Sto step S) of forming a first resist pattern by exposing a substrate having thereon a first resist film to lights, developing the exposed substrate and cleaning the developed substrate; and a second process (step Sto step S) of forming a second resist pattern by forming a second resist film on the substrate having thereon the first resist pattern, exposing the substrate having thereon the second resist film to lights, and developing the exposed substrate. A first processing condition is determined based on first data showing a relationship between a first processing condition under which a cleaning process is performed on the substrate in the first process (step S) and a line width of the second resist pattern, and the first process (step S) is performed on the substrate under the determined first processing condition.

Substrate processing method

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Leuven, Belgium

Yuhei Kuwahara