The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Feb. 09, 2011
Hiroshi Nakamura, Kumamoto, JP;
Takafumi Niwa, Kumamoto, JP;
Yuhei Kuwahara, Yamanashi, JP;
Tadatoshi Tomita, Yamanashi, JP;
Hiroshi Nakamura, Kumamoto, JP;
Takafumi Niwa, Kumamoto, JP;
Yuhei Kuwahara, Yamanashi, JP;
Tadatoshi Tomita, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing method includes a first process (step Sto step S) of forming a first resist pattern by exposing a substrate having thereon a first resist film to lights, developing the exposed substrate and cleaning the developed substrate; and a second process (step Sto step S) of forming a second resist pattern by forming a second resist film on the substrate having thereon the first resist pattern, exposing the substrate having thereon the second resist film to lights, and developing the exposed substrate. A first processing condition is determined based on first data showing a relationship between a first processing condition under which a cleaning process is performed on the substrate in the first process (step S) and a line width of the second resist pattern, and the first process (step S) is performed on the substrate under the determined first processing condition.