Introduction: Te-Hung Wu, based in Tainan County, Taiwan, is a notable inventor with a strong portfolio of 11 patents. His work primarily revolves around advancing photolithography processes, significantly impacting the field of integrated circuit (IC) design and manufacturing.

Latest Patents: Among his latest inventions, Te-Hung Wu has developed several valuable methods for optical proximity correction. One such patent details a method to compensate for optical proximity correction within a photolithography process. This method involves creating an integrated circuit layout that includes active regions, shallow trench isolation (STI) regions, and ion implant regions. The process ensures precise adjustments to the photoresist line width compensation region, ultimately leading to a corrected IC layout that is critical for achieving optimal manufacturing results.

Another significant patent by Wu outlines a method and computer-readable medium for optical proximity correction. This innovative approach starts with a layout of an integrated circuit, specifying exposure intensity. The method approximates the exposure intensity distribution using quadratic polynomial equations and computes local extreme intensities to ensure compliance with exposure specifications. This methodology not only enhances the accuracy of IC production but also optimizes overall manufacturing efficiency.

Career Highlights: Te-Hung Wu currently works at United Microelectronics Corporation, a leading company in semiconductor manufacturing. His contributions have positioned him as a key inventor within the organization, driving advancements in technology that support the company's goals in the competitive semiconductor industry.

Collaborations: Throughout his career, Wu has collaborated with talented individuals such as Yu-Shiang Yang and Chia-Wei Huang. Their joint efforts have led to significant innovations and improvements in the field, showcasing the importance of teamwork in driving technological advancements.

Conclusion: Te-Hung Wu exemplifies the critical role of inventors in the field of technology, particularly in semiconductor manufacturing. With his 11 patents and ongoing commitment to innovation, Wu continues to shape the future of integrated circuit design and photolithography processes, enriching the industry with his expertise and visionary approaches.

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