The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Aug. 07, 2008
Yu-shiang Yang, Tainan County, TW;
Te-hung Wu, Tainan County, TW;
Yung-feng Cheng, Kaohsiung County, TW;
Chuen Huei Yang, Taipei, TW;
Hsiang-yun Huang, Kaohsiung, TW;
Hui-fang Kuo, Kaohsiung, TW;
Shih-ming Kuo, Tainan County, TW;
Lun-hung Chen, Kaohsiung, TW;
Yu-Shiang Yang, Tainan County, TW;
Te-Hung Wu, Tainan County, TW;
Yung-Feng Cheng, Kaohsiung County, TW;
Chuen Huei Yang, Taipei, TW;
Hsiang-Yun Huang, Kaohsiung, TW;
Hui-Fang Kuo, Kaohsiung, TW;
Shih-Ming Kuo, Tainan County, TW;
Lun-Hung Chen, Kaohsiung, TW;
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A method to selectively amend a layout pattern is disclosed. First, a layout pattern including at least a first group and a second group is provided, wherein each one of the first group and the second group respectively includes multiple members. Second, a simulation procedure and an amendment procedure are respectively performed on all the members of the first group and the second group to obtain an amended first group and an amended second group. Then, the amended first group and the amended second group are verified as being on target or not. Afterwards, the layout pattern including the on target amended first group and the on target amended second group is output.