The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
Apr. 30, 2007
Te-hung Wu, Tainan County, TW;
Chuen-huei Yang, Taipei, TW;
Sheng-yuan Huang, Yunlin County, TW;
Chia-wei Huang, Kaohsiung, TW;
Pei-ru Tsai, Tainan County, TW;
Te-Hung Wu, Tainan County, TW;
Chuen-Huei Yang, Taipei, TW;
Sheng-Yuan Huang, Yunlin County, TW;
Chia-Wei Huang, Kaohsiung, TW;
Pei-Ru Tsai, Tainan County, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method for correcting a photomask pattern is provided. The correcting method performs a verification of a focus-exposure matrix (FEM) and an overlay variation on a layout area having contact holes or vias in a layout pattern so as to generate a hint information. The layout pattern of the photomask is corrected according to the hint information to prevent the contact holes or vias from being exposed in arrangement to corresponding metal layer, poly layer, or diffusion layer.