The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Nov. 02, 2007
Te-hung Wu, Tainan County, TW;
Shih-ming Yen, Kaohsiung, TW;
Chih-hao Wu, Taoyuan County, TW;
Chuen-huei Yang, Taipei, TW;
Te-Hung Wu, Tainan County, TW;
Shih-Ming Yen, Kaohsiung, TW;
Chih-Hao Wu, Taoyuan County, TW;
Chuen-Huei Yang, Taipei, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method of inspecting defect of a mask is provided. In this method, a database for storing a plurality of virtual simulation models is created. The virtual simulation models are determined by a plurality of factors including an optical effect and a chemical effect during the transferring the pattern of a mask to the photoresist layer on a wafer. A mask defect image is acquired. A simulation contour of the mask defect image is generated from at least one virtual simulation model in the database. Next, the acceptability of the mask is determined.