This inventor holds 2 USPTO granted patents. Top assignee: United Microelectronics Corp.. Active years: 2010.
Company Filing History:
Years Active: 2010
Title: Shih-Ming Yen: Innovator in Photomask Technology
Introduction
Shih-Ming Yen is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of photomask technology, holding 2 patents that showcase his innovative approach to exposure dose prediction and defect inspection.
Latest Patents
Yen's latest patents include a "Prediction model and prediction method for exposure dose" and a "Method of inspecting photomask defect." The prediction model utilizes a formula to optimize exposure doses in process control systems. This model accounts for various parameters, including preset exposure doses and compensation values. The second patent focuses on a method for inspecting mask defects by creating a database of virtual simulation models. This method evaluates the acceptability of masks based on optical and chemical effects during the pattern transfer process.
Career Highlights
Shih-Ming Yen is currently employed at United Microelectronics Corporation, where he applies his expertise in photomask technology. His work has been instrumental in advancing the efficiency and accuracy of semiconductor manufacturing processes.
Collaborations
Yen collaborates with talented individuals such as Chung-An Chen and Chi-Ching Huang, contributing to a dynamic team environment that fosters innovation and problem-solving.
Conclusion
Shih-Ming Yen's contributions to photomask technology through his patents and collaborative efforts highlight his role as a key innovator in the semiconductor industry. His work continues to influence advancements in manufacturing processes.