The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
Sep. 05, 2007
Ju-te Chen, Tainan, TW;
Chung-an Chen, Taichung, TW;
Chi-ching Huang, Tainan County, TW;
Wen-tsung Wu, Kaohsiung County, TW;
Shih-ming Yen, Kaohsiung, TW;
Ju-Te Chen, Tainan, TW;
Chung-An Chen, Taichung, TW;
Chi-Ching Huang, Tainan County, TW;
Wen-Tsung Wu, Kaohsiung County, TW;
Shih-Ming Yen, Kaohsiung, TW;
United Miceoelectronics Corp., Hsinchu, TW;
Abstract
A prediction model for exposure dose is indicated by the following formula, E=E+E, wherein E represents an optimized exposure dose, Erepresents a preset exposure dose of a process control system, and Erepresents an exposure dose compensation value, and=[()/()]×(')×(),wherein MTTrepresents the differences between the MTT value of a previous lot and the MTT value of a next lot, CDrepresents the actual critical dimension of the mask, X represents the magnification of the mask, Erepresents the actual exposure dose of a previous lot, A′ represents an experimental value obtained from the results of different lots, Wrepresents the last batch of weights and Wrepresents an average weight, and CD, E, A′, Wand Ware set parameters built into the process control system.