The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
May. 27, 2010
Yu-shiang Yang, Madou Township, Tainan County, TW;
Ming-jui Chen, Tainan, TW;
Te-hung Wu, Xinshi Township, Tainan County, TW;
Yu-Shiang Yang, Madou Township, Tainan County, TW;
Ming-Jui Chen, Tainan, TW;
Te-Hung Wu, Xinshi Township, Tainan County, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method optical proximity correction includes the following steps. First, a layout of an integrated circuit with an exposure intensity specification is provided. The integrated circuit includes a plurality of patterns and each pattern has an exposure intensity distribution. Second, a quadratic polynomial equation of each exposure intensity distribution is approximated. Third, a local extreme intensity of each exposure intensity distribution is computed by fitting the quadratic polynomial equation. Fourth, the local extreme intensity is determined whether violating the exposure intensity specification or not. Then, the layout is corrected when the local extreme intensity violates the exposure intensity specification.